发明名称 A METHOD TO AVOID STRIAE IN EUV LITHOGRAPHY MIRRORS
摘要 A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material (41) to produce an EUV mirror blank (43) and polishing a top face of the EUV mirror blank (43) to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material (61); sagging a plate of the glass material over the top face of the piece (63) to produce an EUV mirror blank (66); and polishing a top face of the EUV mirror blank to produce an EUV polished mirror (65).
申请公布号 WO0232622(A1) 申请公布日期 2002.04.25
申请号 WO2001US29100 申请日期 2001.09.18
申请人 CORNING INCORPORATED 发明人 DAVIS, CLAUDE, L., JR.;BEST, MICHAEL, E.;EDWARDS, MARY, J.;HOBBS, THOMAS, W.;MURRAY, GREGORY, L.
分类号 C03B8/04;B24B1/00;B24B13/06;C03B19/14;C03B23/025;(IPC1-7):B24B7/24 主分类号 C03B8/04
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