发明名称 FOCUSED ION BEAM SYSTEM
摘要 An ion source (230) of a focusing ion beam system (200) includes a dielectric bushing (308) for supporting metallic optical elements (316, 320) and forming an ion gun vacuum chamber (304) in which are contained an emitter assembly (312) and other optical elements (314, 316).
申请公布号 WO0233727(A1) 申请公布日期 2002.04.25
申请号 WO2001US32502 申请日期 2001.10.17
申请人 FEI COMPANY;GERLACH, ROBERT, L.;TESCH, PAUL;MARTIN, NOEL, PAUL;SKOCZYLAS, WALTER;PROCYK, DREW 发明人 GERLACH, ROBERT, L.;TESCH, PAUL;MARTIN, NOEL, PAUL;SKOCZYLAS, WALTER;PROCYK, DREW
分类号 H01J27/26;G01Q30/16;H01J37/08;H01J37/09;H01J37/16;H01J37/18;H01J37/30;H01J37/317;(IPC1-7):H01J37/00 主分类号 H01J27/26
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