A lithographic stage includes a platen (31) having a top face and a bottom face and a holder (32) for holding an optical component on the top face of the platen. The platen is made of a light-weight material such as high purity fused silica or ultra low expansion glass. The bottom face of the platen may further include means for connecting to a positioning device in an extreme ultraviolet lithography system.
申请公布号
WO0233485(A1)
申请公布日期
2002.04.25
申请号
WO2001US29895
申请日期
2001.09.26
申请人
CORNING INCORPORATED
发明人
ACKERMAN, BRADFORD, G.;BOWDEN, BRADLEY, F.;DAVIS, CLAUDE, L., JR.;HRDINA, KENNETH, E.