发明名称 SILICA-BASED LIGHT-WEIGHT EUV LITHOGRAPHY STAGES
摘要 A lithographic stage includes a platen (31) having a top face and a bottom face and a holder (32) for holding an optical component on the top face of the platen. The platen is made of a light-weight material such as high purity fused silica or ultra low expansion glass. The bottom face of the platen may further include means for connecting to a positioning device in an extreme ultraviolet lithography system.
申请公布号 WO0233485(A1) 申请公布日期 2002.04.25
申请号 WO2001US29895 申请日期 2001.09.26
申请人 CORNING INCORPORATED 发明人 ACKERMAN, BRADFORD, G.;BOWDEN, BRADLEY, F.;DAVIS, CLAUDE, L., JR.;HRDINA, KENNETH, E.
分类号 G03F7/20;H01L21/027;H01L21/68;(IPC1-7):G03B27/58;G03B27/42 主分类号 G03F7/20
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