| 发明名称 |
Photosensitive polyimide precursor and its use for pattern formation |
| 摘要 |
A polyimide precursor having repeating units of the formula: wherein R1 is a tetravalent organic group having 4 or more carbon atoms; R2 is a trivalent or tetravalent organic group having one or more aromatic rings; R3 is a monovalent organic group; A is a monovalent group showing acidity; and n is an integer of 1 or 2, is effective for preparing a highly sensitive negative-working photosensitive material developable with an alkaline aqueous solution in a short time with high resolution.
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| 申请公布号 |
US2002048726(A1) |
申请公布日期 |
2002.04.25 |
| 申请号 |
US20010955042 |
申请日期 |
2001.09.19 |
| 申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
KIKKAWA HARUHIKO;KATAOKA FUMIO;TAKEMOTO ISSEI;TANAKA JUN;ISODA KEIKO;UCHIMURA SHUNICHIRO;KAJI MAKOTO;SUGIURA MINORU |
| 分类号 |
G03F7/027;C08G73/10;C08L79/08;G03F7/031;G03F7/038;G03F7/40;H01L21/027;H01L21/312;(IPC1-7):G03F7/038 |
主分类号 |
G03F7/027 |
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