发明名称 Optical element deformation system
摘要 In a system for specific deformation of optical elements in an imaging device, in particular in a projection exposure machine having a projection lens for micro-lithography, for the purpose of eliminating image errors or for active adjustment, piezoelectric elements are applied as actuators in the form of thin plates, films or layers to surfaces to be deformed, or integrated into them. In conjunction with an adaptronic servo loop having sensors, forces and/or moments are exerted on the optical elements for their specific deformation by means of a controlled activation of the piezoelectric elements as actuators.
申请公布号 US2002048096(A1) 申请公布日期 2002.04.25
申请号 US20010956715 申请日期 2001.09.19
申请人 MELZER FRANK;MUHLBEYER MICHAEL;GELLRICH BERNHARD;SORG FRANZ;XALTER STEFAN;ITTNER THOMAS 发明人 MELZER FRANK;MUHLBEYER MICHAEL;GELLRICH BERNHARD;SORG FRANZ;XALTER STEFAN;ITTNER THOMAS
分类号 G02B26/00;G02B5/10;G02B13/24;G02B26/06;G02B26/08;G02B27/00;G02B27/18;G03F7/20;H01L21/027;(IPC1-7):G02B5/08;G02B15/14;G02B7/182;G02B7/02 主分类号 G02B26/00
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