发明名称 GAS SEPARATING AND PURIFYING METHOD AND ITS APPARATUS
摘要 <p>A gas separation and purification method for efficiently recovering a high added-value gas such as krypton or xenon used as the atmosphere gas of a semiconductor manufacturing apparatus through the PSA process. For a method for separating and purifying the high added-value gas with a mixture gas containing the high added-value gas used as the raw material gas by the pressure-variable adsorption separating method, the balanced type pressure-variable adsorption separating method for separating gas components on the basis of a balanced adsorption difference and the speed type pressure-variable adsorption separating method for separating gas components on the basis of an adsorption speed difference are combined for the use of separating and purifying the high added-value gas.</p>
申请公布号 WO2002032550(P1) 申请公布日期 2002.04.25
申请号 JP2001009189 申请日期 2001.10.19
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