发明名称 Semiconductor device
摘要 A semiconductor device having a PHS layer on the back surface thereof, preventing from a short circuit between a bonding wire and a first metal layer. Forming catalyst layer on a bottom of a first separation groove formed in the front surface of a semiconductor substrate, forming the first metal layer selectively in the first separation groove by an electroless plating technique using the catalyst layer as a catalyst.
申请公布号 US2002048903(A1) 申请公布日期 2002.04.25
申请号 US20010986325 申请日期 2001.11.08
申请人 KOSAKI KATSUYA;NAKANO HIROFUMI;KUNII TETSUO 发明人 KOSAKI KATSUYA;NAKANO HIROFUMI;KUNII TETSUO
分类号 H01L21/301;H01L21/288;H01L21/68;H01L21/78;H01L23/367;(IPC1-7):H01L21/301 主分类号 H01L21/301
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