| 摘要 |
A wafer-level packaging process comprising: forming a patterned photoresist on a wafer covering a plurality of scribe lines and bump forming locations; forming a stress buffer layer on the regions not covered by the patterned photoresist; after removal of the patterned photoresist a plurality of first openings are defined in the stress buffer layer that also exposes the scribe lines; arranging either a stencil or a second patterned photoresist having a plurality of second openings over the wafer to cover the stress buffer layer and scribe lines, such that the second openings expose the first openings; filling a solder material in the openings; performing a reflow process, wherein according to the use of either the stencil or second photoresist, the reflow is respectively performed after or before the removal thereof. After dicing, the thus-packaged wafer can be directly connected onto an external carrier. |
