| 摘要 |
A dry film resist is used to form an interlayer insulating film in a process for fabricating a liquid crystal display device of the POP structure. The dry film resist is formed by applying a photosensitive resin on a base film to a uniform thickness, and a protective film layer is formed on a surface of the photosensitive resin film thus formed. From the dry film resist guided to the vicinity of a glass substrate, the protective film is removed immediately before transfer. Then, the photosensitive resin is heated and pressed against the foregoing glass substrate by a transfer roller, whereby the interlayer insulating film is formed.
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