发明名称 Thin film transistor and method for fabricating the same
摘要 A thin film transistor comprises a gate electrode 18 formed on a substrate 10, a gate insulation film 20, a semiconductor layer 22, a source electrode 36a and a drain electrode 36b. The gate electrode, the source electrode or the drain electrode include a first conductor film 12, a second conductor film 14 and a third conductor film 16. The first conductor film is formed of a metal selected out of Al, Cu and Ag, or an alloy of a metal, as a main component, selected out of Al, Cu and Ag, and has the side surfaces sloped. The second conductor film is formed of a film of Mo containing nitrogen, or an alloy of Mo, as a main component, containing nitrogen, and has the side surfaces sloped. The third conductor film is formed of Mo or an alloy of Mo as a main component.
申请公布号 US6376861(B1) 申请公布日期 2002.04.23
申请号 US20000713890 申请日期 2000.11.16
申请人 FUJITSU LIMITED 发明人 YAEGASHI HIROYUKI;WATANABE TAKUYA;KIDA TETSUYA;KOMORITA AKIRA
分类号 H01L29/786;G02F1/136;H01L21/28;H01L21/77;H01L21/84;H01L27/12;H01L29/45;H01L29/49;(IPC1-7):H01L29/04;H01L31/20;H01L31/036;H01L31/037 主分类号 H01L29/786
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