发明名称 Lateral bipolar transistor formed on an insulating layer
摘要 In a bipolar transistor improved to exhibit an excellent high-frequency property by decreasing the width of the intrinsic base with without increasing the base resistance, an emitter region, intrinsic base region and collector region are closely aligned on an insulating layer, and the intrinsic base region and the collector region make a protrusion projecting upward from the substrate surface. The protrusion has a width wider than the width of the intrinsic base region.
申请公布号 US6376897(B2) 申请公布日期 2002.04.23
申请号 US19990314114 申请日期 1999.05.19
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 YAMADA TAKASHI;NII HIDEAKI;YOSHIMI MAKOTO;SHINO TOMOAKI;INOH KAZUMI;KAWANAKA SHIGERU;FUSE TSUNEAKI;YOSHITOMI SADAYUKI
分类号 H01L21/331;H01L29/10;H01L29/73;(IPC1-7):H01L29/00;H01L27/082;H01L27/102;H01L29/70;H01L27/01 主分类号 H01L21/331
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