Zirconium alkoxytris (beta-Diketonate), process for manufacturing the same, and liquid composition for formation of PZT film

摘要

There is provided a compound for the formation of a PZT film using Pb(dpm)2 where the compound has a low reactivity with Pb(dpm)2, has a thermal decomposition temperature which is lower than Zr(dpm)4 and is well soluble in a solvent such as butyl acetate and toluene. There is also provided a process for the manufacture of the compound. There is further provided a liquid composition for the formation of a PZT film using the compound. The novel compound Zr(OiPr)(dpm)3 has a sublimation pressure of 0.1 Torr/160° C. and is able to form a ZrO2 film by a CVD at 400° C. That can be prepared by the reaction of 1 mol of Zr(OiPr)4 and 3 mol of dpmH in an organic solvent followed by purifying by sublimation. A solution of Pb(dpm)2, Zr(OiPr)(dpm)3 and Ti(OiPr)2(dpm)2 dissolved in butyl acetate has a long pot life and forms a PZT film by a solution flash CVD method.