发明名称 |
Single semiconductor wafer processor |
摘要 |
An apparatus for processing or drying a semiconductor wafer includes a rotor for holding a wafer and for spinning the wafer about a first axis. A pivot arm supports the rotor, so that the rotor can pivot about a second axis that is substantially perpendicular to the first axis. A basin holding a processing fluid is located below the rotor, with the rotor vertically movable into and out of the processing fluid via an elevator supporting the pivot arm. The rotor is pivotable into a position where it holds the wafer at an inclined angle so that the wafer may be withdrawn from the processing fluid at said inclined angle to facilitate drying of the wafer.
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申请公布号 |
US6374837(B2) |
申请公布日期 |
2002.04.23 |
申请号 |
US20010859930 |
申请日期 |
2001.05.17 |
申请人 |
SEMITOOL, INC. |
发明人 |
SCRANTON DANA;CURTIS GARY L. |
分类号 |
H01L21/304;H01L21/00;(IPC1-7):B08B3/00 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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