发明名称 Method of making a pn-junction in a semiconductor element
摘要 A pn-junction in a semiconductor element is made in that, within a zone of a first conductivity type, by means of implantation, a first and second zone of a second conductivity type are formed which are initially separated from each other, with subsequent diffusion processes, as a result of lateral diffusion, the first and second zones combine into a connected well, by means of implantation, a further zone of the first conductivity type is formed which completely overlaps the first zone of the second conductivity type and which is larger than the first zone, and which does not touch the second zone of the second conductivity type.
申请公布号 US6376321(B1) 申请公布日期 2002.04.23
申请号 US20000690218 申请日期 2000.10.17
申请人 SENTRON AG 发明人 POPOVIC RADIVOJE;PAUCHARD ALEXANDRE;ROCHAS ALEXIS
分类号 H01L27/14;H01L21/265;H01L21/266;H01L21/324;H01L21/329;H01L21/8236;H01L27/088;H01L29/06;H01L29/78;H01L31/10;H01L31/107;H01L31/18;(IPC1-7):H01L21/22 主分类号 H01L27/14
代理机构 代理人
主权项
地址