发明名称 Photosensitive resin and photosensitive resin composition containing the same
摘要 The present invention relates to a novel photosensitive resin which can be developed in water and which can be used as a photosensitive resin composition. More specifically, the present invention relates to a composition which is useful as a photosensitive soldering resist for printed circuit board.
申请公布号 US6376609(B2) 申请公布日期 2002.04.23
申请号 US20010782256 申请日期 2001.02.14
申请人 AJINOMOTO CO., INC. 发明人 NAKAMURA SHIGEO;YOKOTA TADAHIKO
分类号 C08G59/14;C09D163/10;G03F7/029;G03F7/038;(IPC1-7):G03F7/028;G09D11/10;G09D163/00;C08J3/28;C08L63/00 主分类号 C08G59/14
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