发明名称 Process and manufacturing tool architecture for use in the manufacturing of one or more protected metallization structures on a workpiece
摘要 A process for providing one or more protected copper elements on a surface of a workpiece is set forth. In accordance with the process, a barrier layer is applied to the workpiece. If the barrier layer is not suitable as a seed layer for subsequent electroplating processes, a separate seed layer is applied over the surface of the barrier layer. One or more copper elements are then electroplated on selected portions of the seed layer or, if suitable, the barrier layer. If used, the seed layer is then substantially removed. At least a portion of a surface of the barrier layer is rendered unplatable while leaving the copper elements suitable for electroplating. A protective layer is then electroplated onto surfaces of the one or more copper elements.
申请公布号 US6376374(B1) 申请公布日期 2002.04.23
申请号 US19980076565 申请日期 1998.05.12
申请人 SEMITOOL, INC. 发明人 STEVENS E. HENRY
分类号 C25D5/02;C25D7/12;H01L21/288;H01L21/3205;H01L21/3213;H01L21/768;(IPC1-7):H01L22/44 主分类号 C25D5/02
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