GAS INJECTION SYSTEM FOR PLASMA PROCESSING,申请号IL19990144001-传众专利搜索

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发明名称	GAS INJECTION SYSTEM FOR PLASMA PROCESSING
摘要
申请公布号	IL144001(D0)	申请公布日期	2002.04.21
申请号	IL19990144001	申请日期	1999.12.07
申请人	LAM RESEARCH CORPORATION	发明人
分类号	H05H1/46;B01J19/08;C23C16/507;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H01J	主分类号	H05H1/46
代理机构		代理人
主权项
地址

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