发明名称 ATOMIC LITHOGRAPHY USING SQUEEZED ATOMIC STATES
摘要 A method and apparatus for performing atomic and molecular nano-deposition by means of atomic or molecular focusing through a plurality of optical standing waves. A stacked set of standing light waves, preferably arranged as gratings in a predetermined form and of predetermined intensities, is used to sequentially compress or squeeze the width of the incident atomic or molecular beam into ultra-narrow, spatially localized spots or lines. The result is a focused beam of particles with improved resolution compared with prior art atomic focusing. Furthermore, spherical and chromatic aberrational effects can be reduced.
申请公布号 IL143538(D0) 申请公布日期 2002.04.21
申请号 IL20010143538 申请日期 2001.06.03
申请人 YEDA RESEARCH AND DEVELOPMENT CO. LTD. 发明人
分类号 G03F7/00;G03F7/20;G03H1/04;H01J37/317;H01L;H01S1/00;H01S3/00 主分类号 G03F7/00
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