THERMAL CVD SYSTEM FOR DEPOSITING GRAPHITE NANOFIBER THIN FILM

摘要

PROBLEM TO BE SOLVED: To constitute a thermal CVD system so that a graphite nanofiber thin film having uniform film-thickness distribution can be deposited independently of the size and appearance of a substrate. SOLUTION: This system has: a resistance heater (a first heating means) 121c provided inside a substrate holder 121 provided to the inside of a vacuum chamber 12; and a plurality of infrared lamps (a second heating means) 17 provided above the chamber in a manner to be opposed to a substrate S to be treated. The introduction of carbon-containing gas and gaseous hydrogen each necessary for the deposition of the graphite nanofiber thin film is performed via a gas injection nozzle means 19 which is located in a position at a height below the position of the substrate S in a manner to surround the substrate in the vicinity of its outside periphery. The nozzle means connected to a gas source outside the vacuum chamber has a gas passage 191 inside, and further, a plurality of gas injection holes 192 communicating with the gas passage are provided in line to the top surface of the nozzle means.