| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a mask for exposure capable of preventing the occurrence of an unnecessary projected pattern part in exposure using a single phase shift mask by a single exposure. SOLUTION: The mask for exposure includes a light transmissive substrate (11), a light shielding film (12) disposed on the substrate, at least one pair of phase shifters (14A and 14B) for generating transmitted light rays which cause 180 deg. phase difference between those, first polarizing films (15) disposed on each of the phase shifters and a second polarizing film (16) disposed in a region except the regions with the arranged phase shifters.</p> |
