APPARATUS AND METHOD FOR INSPECTING FOREIGN MATTER AND DEFECT

摘要

PROBLEM TO BE SOLVED: To reduce the time for inspection by increasing the sensitivity and speed for inspecting an object to be, such as a semiconductor wafer or the like for foreign matter or defects. SOLUTION: With laser beams of different wavelengths, the surface of the object to be inspected is irradiated at various angles, and the conditions of foreign matter or defects are classifiedly detected according to the levels of the scattered beams.