METHOD FOR FABRICATING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

摘要

PURPOSE: A method for fabricating a semiconductor integrated circuit device is provided to improve resolution of a pattern, by transcribing a predetermined pattern while using a photomask in a semiconductor wafer. CONSTITUTION: A photoresist layer is deposited on the semiconductor wafer. A predetermined pattern is transcribed into the semiconductor wafer by irradiating exposure light to the photoresist layer on the wafer through the photomask. Main apertures(3) transfer the predetermined pattern to a mask substrate(1), a half-tone film(2) on the mask substrate and an aperture formed by removing a part of the half-tone film. Auxiliary apertures(4) are not resolved on the semiconductor wafer as the aperture formed by removing a part of the half-tone film is used to improve the resolution of the pattern.