| 摘要 |
PROBLEM TO BE SOLVED: To provide a carburetor of a raw material solution for thin film deposition which can increase the flow rate of the gaseous raw material to be fed in a film deposition area and preventing film peeling causing generation of particles inside the carburetor in a CVD apparatus for vaporizing the raw material solution to deposit a film in a vacuum container. SOLUTION: This carburetor for the raw material of the thin film deposition film solution comprises an atomizer having a spray nozzle on a distal end side to spray the raw material of the thin film deposition solution toward the spray nozzle, and a vaporizing chamber with one end side connected to the distal end side and the other end connected to a pipe to the vacuum container side. The vaporizing chamber accommodates a vaporizing part, and has a flow passage in which the gaseous raw material of the thin film deposition solution vaporized after being sprayed from the spray nozzle of the atomizer is passed into the pipe to the vacuum container side. The vaporizing part comprises a vaporizing surface facing the spray nozzle of the atomizer and formed in a recessed surface with respect to the spray nozzle side, and a built-in heat generating means which heats the vaporizing surface for vaporizing the raw material of the thin film deposition solution sprayed from the spray nozzle of the atomizer.
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