| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning treatments which can improve cleaning efficiency. SOLUTION: The apparatus comprises a plurality of treating units 11a-11d, having one or more kinds of chemicals among a plurality of kinds of chemicals A-C for treating a work (wafer) W. The same kind of chemicals is set in at least two treating units. For treating works W in individual treatment sequences one after the other, the works W are carried to the treating units, having chemicals suited to each treating sequence.
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