POSITIVE TYPE PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive type photoresist composition excellent in various characteristics as a resist such as sensitivity, resolution and focal depth and capable of suppressing the occurrence of foreign matter on a resist pattern. SOLUTION: The positive type photoresist composition contains (A) a compound which generates an acid when irradiated with active light or radiation, (B) an alkali-insoluble or slightly alkali-soluble resin which is decomposed by the action of the acid to increase its solubility in an alkali developing solution and (C) a compound of a specified formula.