发明名称 THIN FILM TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a thin film transistor having high mobility with improved reproducibility. SOLUTION: In the thin film transistor, a laser beam oscillating continuously is applied to an amorphous semiconductor thin film where the concentration of carbon, nitrogen, and oxygen is equal to or less than 5×1019 cm-3, and a semiconductor thin film obtained by crystallization without melting the amorphous semiconductor thin film is used for a channel formation region. By selecting this sort of crystallization method, the thin film transistor with high mobility can be provided with improved reproducibility.
申请公布号 JP2002118120(A) 申请公布日期 2002.04.19
申请号 JP20010258635 申请日期 2001.08.28
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI;CHO KOYU;KUSUMOTO NAOTO;TAKEMURA YASUHIKO
分类号 H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L21/336 主分类号 H01L21/20
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