| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for positioning edge of a pattern element on a substrate, capable of very accurately, speedily, and reproducibly measuring the edge position in edges constituted, as desired, at the lower level of accuracy of pixels. SOLUTION: The model and intensity profile of a model edge for distinguishing a completely non-linear edge to be measured are detected and stored. A desired edge position Xk is defined within the model and the intensity profile at the lower level of accuracy of pixels. The camera image of a substrate with the edge to be measured is recorded. Then the one-dimensional measurement and intensity profile of the edge to be measured are determined. The model and intensity profile are distinguished, by the data of the location Xm within the measurement and the intensity profile relative to a reference point. A retrieval position (p) of the edge to be measured is determined at the lower level of accuracy of pixels, using p=Xm+Xk. |
