发明名称 PROCESS FOR DEPOSITING GRAPHITE NANOFIBER THIN FILM BY THERMAL CVD PROCESS
摘要 PROBLEM TO BE SOLVED: To improve the adhesion between a metallic thin film undercoat layer and a substrate in the deposition of a graphite nanofiber thin film used for a carbon based electron emission source. SOLUTION: A substrate obtained by depositing the surface of a glass substrate or an Si substrate with a thin film of Fe, Co or an alloy containing at least one kind of those metals into prescribed patterns is placed in an evacuated vacuum chamber and is subjected to heat treatment in a vacuum, after that, a carbon-containing gas and gaseous hydrogen are introduced into the chamber, the pressure in the chamber is kept at about 1 atm., and graphite nanofiber is grown only on the pattern parts on the substrate by a thermal CVD process.
申请公布号 JP2002115058(A) 申请公布日期 2002.04.19
申请号 JP20000307960 申请日期 2000.10.06
申请人 ULVAC JAPAN LTD 发明人 HIRAKAWA MASAAKI;MURAKAMI HIROHIKO
分类号 B82B3/00;C01B31/02;C23C16/26;D01F9/133;H01J9/02 主分类号 B82B3/00
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