发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a lamp annealing apparatus with which variation of the temperature distribution on a wafer, accompanying the variation of the light transparency of a process tube is made small. SOLUTION: A light emitter and a light receiver of a transmission-type sensor are installed on the outside of the process tube, and by monitoring the light transparency of the process tube, the timing of the exchange of the tube can be informed and the lamp power can be controlled by feeding back the monitored result, so as to reduce the variations in the temperature distribution on the wafer.
申请公布号 JP2002118072(A) 申请公布日期 2002.04.19
申请号 JP20000309533 申请日期 2000.10.10
申请人 SEIKO INSTRUMENTS INC 发明人 TSURU KIYOHIRO
分类号 H01L21/31;C30B31/12;H01L21/00;H01L21/26;(IPC1-7):H01L21/26 主分类号 H01L21/31
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