发明名称 METHOD FOR DEPOSITING GRAPHITE NANOFIBER THIN FILM BY THERMAL CVD METHOD
摘要 PROBLEM TO BE SOLVED: To improve adhesion between a metallic thin film as an undercoat layer and a substrate in depositing a graphite nanofiber thin film used for a carbon electron emission source. SOLUTION: A thin film of non-catalytic metal is deposited on a glass substrate or Si substrate into a prescribed pattern, and then a thin film of catalytic metal composed of Fe, Co or alloy containing at least either of these metals is deposited into a prescribed pattern on the above pattern of non-catalytic metal. This substrate is placed in an evacuated vacuum chamber and heated. Then carbon-containing gas and gaseous hydrogen are introduced into the vacuum chamber and pressure inside the chamber is held at about 1 atm to grow graphite nanofibers in the pattern part alone on the substrate by a thermal CVD method. Moreover, before exerting the thermal CVD method, the substrate is heat treated under vacuum.
申请公布号 JP2002115070(A) 申请公布日期 2002.04.19
申请号 JP20000307961 申请日期 2000.10.06
申请人 ULVAC JAPAN LTD 发明人 HIRAKAWA MASAAKI;MURAKAMI HIROHIKO
分类号 B82B3/00;C01B31/02;C23C16/26;C23C16/46;D01F9/133;H01J9/02 主分类号 B82B3/00
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