发明名称 ELECTROSTATIC CHUCK, SEMICONDUCTOR PROCESSING SYSTEM AND SEPARATING METHOD OF ELECTROSTATIC CHUCK
摘要 <p>PROBLEM TO BE SOLVED: To provide an electrostatic chuck, a semiconductor processing system and a separating method of electrostatic chuck where the work for removing an article to be processed from a mounting table can be simplified. SOLUTION: The electrostatic chuck attracts a wafer 1 to a table 2 by a Coulomb force generated between the table and the wafer by applying a voltage between them. The electrostatic chuck comprises a DC power supply 4 for applying a voltage between the central part 11 and the outer circumferential part 12 of the table when the wafer 1 is attracted to the table 2, an AC power supply 5 for applying a voltage between the central part 11 and the outer circumferential part 12 of the table when the wafer 1 is separated from the table 2, and a control section 7 for attenuating and oscillating the voltage being applied from the AC power supply.</p>
申请公布号 JP2002118164(A) 申请公布日期 2002.04.19
申请号 JP20000306140 申请日期 2000.10.05
申请人 SEIKO EPSON CORP 发明人 TERASAKI ATSUNORI
分类号 B23Q3/15;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 B23Q3/15
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