| 摘要 |
PROBLEM TO BE SOLVED: To manufacture at high productivity a transparent laminate with high quality such as high transparency or high conductivity by forming at high speed a metal oxide thin layer with a sputtering method without oxidizing a silver base transparent conductor thin layer which is a substrate when the metal oxide thin layer is laminated as a transparent thin layer on the silver base transparent conductor thin film. SOLUTION: This transparent laminate is manufactured by repeatedly laminating a combination of the silver base transparent conductor thin layer having a thickness of 1-30 nm and the transparent thin layer having a thickness of 10-300 nm, and using the metal oxide thin layer in at least one of the transparent thin layers laminated on the silver base transparent conductor thin layer. When the metal oxide thin layer is formed with the sputtering method, the sputtering using a metal oxide target is conducted, and then reactive sputtering using a metal target is conducted.
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