发明名称 |
SUBSTRATE FOR RECORDING MEDIUM, METHOD FOR MANUFACTURING SUBSTRATE FOR RECORDING MEDIUM AND RECORDING MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate consisting of thermoplastic resin, wherein few blisters are generated on its surface even after the substrate is left in the condition of high temperature/high humidity and low temperature for a long period and to provide a method for manufacturing the substrate and a recording medium using the substrate. SOLUTION: Degraded/oxidized sub-products of a substrate constituent material for the recording medium consisting of the thermoplastic resin is controlled to be <=30 ppb based on the weight of the substrate. The substrate is obtained by being annealed under the atmosphere of inert gas having <=7% oxygen concentration after the substrate is molded of the thermoplastic resin.
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申请公布号 |
JP2002117523(A) |
申请公布日期 |
2002.04.19 |
申请号 |
JP20000309374 |
申请日期 |
2000.10.10 |
申请人 |
FUJI ELECTRIC CO LTD |
发明人 |
SUZUKI KATSUNORI;SAKAGUCHI SHOJI;ISO AKIYOSHI;TEI YOICHI |
分类号 |
G11B5/73;(IPC1-7):G11B5/73 |
主分类号 |
G11B5/73 |
代理机构 |
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地址 |
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