发明名称 |
ELECTROSTATICALLY CLAMPED EDGE RING FOR PLASMA PROCESSING |
摘要 |
<p>A coupling ring assembly including an edge ring supported by an electrostatic edge ring chuck and a method of improving the temperature control of an edge ring in a plasma processing chamber. The edge ring can be made of a conductive material such as silicon or silicon carbide and temperature control of the edge ring can be enhanced by supplying heat transfer gas such as helium between opposed surfaces of the edge ring and the edge ring chuck.</p> |
申请公布号 |
WO0231219(A1) |
申请公布日期 |
2002.04.18 |
申请号 |
WO2001US30286 |
申请日期 |
2001.09.26 |
申请人 |
LAM RESEARCH CORPORATION;HUBACEK, JEROME S. |
发明人 |
HUBACEK, JEROME S. |
分类号 |
H01L21/3065;C23C16/458;H01L21/00;H01L21/683;(IPC1-7):C23C16/00;C23F1/02 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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