发明名称 RADIO FREQUENCY MATCHING UNIT OF PLASMA EQUIPMENT
摘要 PURPOSE: A radio frequency(RF) matching unit of plasma equipment is provided to stably perform a process by minimizing rotation resistance caused by particles such that the rotation resistance is generated by rotation friction in an air variable condenser. CONSTITUTION: The RF matching unit(110a,110b) functions to apply RF power to an induction coil(104). A plurality of rods fix an upper plate and a lower plate. A rotation axis crosses the upper plate and the lower plate. The air variable condenser has an oilless bearing for supporting the rotation axis at the upper and lower plates. The RF matching unit includes the upper plate, the lower plate, the plurality of rods, the rotation axis and the oilless bearing.
申请公布号 KR20020029208(A) 申请公布日期 2002.04.18
申请号 KR20000060036 申请日期 2000.10.12
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 NAMKOONG, DONG HUN
分类号 H01L21/20;(IPC1-7):H01L21/20 主分类号 H01L21/20
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