| 发明名称 |
Method for controlling flatness of wafer and manufacturing method of thin-film magnetic head |
| 摘要 |
A gas at an extremely low temperature is jet-sprayed onto a warped concave surface of a wafer to correct this warped concave surface flat.
|
| 申请公布号 |
US2002045352(A1) |
申请公布日期 |
2002.04.18 |
| 申请号 |
US20010867425 |
申请日期 |
2001.05.31 |
| 申请人 |
KUBOTA TOSHIO;KIMURA FUJIMI |
发明人 |
KUBOTA TOSHIO;KIMURA FUJIMI |
| 分类号 |
G11B5/31;H01L21/304;H01L21/3213;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
G11B5/31 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
