| 摘要 |
PURPOSE: A method of fabricating an array substrate for an LCD device is provided to use a photoresist having a low exposing speed while patterning a protective layer of four mask processes, so as to improve productivity by reducing processing steps at a lower cost. CONSTITUTION: A transparent substrate(111) is prepared. The first metal material is deposited on the substrate(111) and is patterned, to form a gate electrode, a gate wire(113), and a gate pad(136). A gate insulating layer(150), an amorphous silicone layer(155), an impure amorphous silicone layer, and the second metal layer are deposited on the substrate(111) and are patterned, to form a data wire. The data wire defines a pixel area by crossing over the gate wire, a source electrode, and a drain electrode. A protective layer(160) is formed by depositing an insulating material on a front side of the substrate(111). By using the first sub mask for coating a photoresist on top of the protective layer(160) and intercepting the source electrode and the drain electrode, portions of the photoresist are exposed. By using the second sub mask for intercepting the source and the drain areas on top of the exposed photoresist and an upper side of the gate wire, the photoresist is exposed. By performing a dry etching for the surface of the substrate(111), the gate pad(136) connected with the gate wire is exposed with the gate insulating layer remaining on top of the gate wire. A pixel electrode contacted with the drain electrode is formed.
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