发明名称 |
CO2-PROCESSES PHOTORESISTS, POLYMERS, AND PHOTOACTIVE COMPOUNDS FOR MICROLITHOGRAPHY |
摘要 |
A process of forming a resist image in a microelectronic substrate comprises the steps of contacting the substrate with a composition first comprising carbon dioxide and a component selected from the group consisting of at least one polymeric precursor, at least one monomer, at least one polymeric material, and mixtures thereof to deposit the component on the substrate and form a coating thereon; then imagewise exposing the coating to radiation such that exposed and unexposed coating portions are formed; thensubjecting the coating to a second composition comprising carbon dioxide having such that either one of the exposed or the unexposed coating portions are removed from the substrate and the other coating portion is developed and remains on the coating to form an image thereon.
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申请公布号 |
WO0231596(A1) |
申请公布日期 |
2002.04.18 |
申请号 |
WO2001US31504 |
申请日期 |
2001.10.10 |
申请人 |
UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL;NORTH CAROLINA STATE UNIVERSITY |
发明人 |
KENDALL, JONATHAN;DESIMONE, JOSEPH, M.;CARBONELL, RUBEN, G.;MCADAMS, CHRISTOPHER, L. |
分类号 |
G03F7/004;G03F7/039;G03F7/16;G03F7/26;G03F7/30;G03F7/32;G03F7/36;G03F7/42;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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