发明名称 Apparatus for detecting defects in semiconductor devices and methods of using the same
摘要 The present invention provides apparatus and methods for detecting defects in a semiconductor device. The semiconductor device includes a plurality of conductive pads, which may be formed, for example, between insulating layers for insulating the conductive pads from conductive lines formed between ones of the conductive pads. Electrons and/or holes are accumulated in ones of the conductive pads, for example, on the surface of the conductive pads. A contrast associated with one of the conductive pads is detected based on secondary electron emissions from the ones of the conductive pads after accumulation of the electrons and/or holes. The presence of defects is determined based on the detected contrast.
申请公布号 US2002043628(A1) 申请公布日期 2002.04.18
申请号 US20010940943 申请日期 2001.08.28
申请人 KIM YANG-HYONG;KANG HYO-CHEON;KIM DEOK-YONG 发明人 KIM YANG-HYONG;KANG HYO-CHEON;KIM DEOK-YONG
分类号 G01Q30/02;G01Q30/04;G01R31/307;H01J37/26;(IPC1-7):G21G5/00 主分类号 G01Q30/02
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