Batch-type heat treatment apparatus and control method for the batch-type heat treatment apparatus

摘要

A heat treatment apparatus for making a heat treatment while estimating temperatures of objects-to-be-processed can estimate correct temperatures of the objects-to-be-processed. A reaction tube 2 comprises heaters 31-35, and temperature sensors Sin1-Sin5, Sout1-Sout5, and receives a wafer boat 23. A controller 100 estimates temperatures of wafers W and temperatures of the temperature sensors Sin1-Sin5 in 5 zones in the reaction tube 2 corresponding to the heaters 31-35 by using the temperature sensors Sin1-Sin5, Sout1-Sout5 and electric powers of the heaters 31-35. Based on relationships between estimated temperatures of the temperature sensors Sin1-Sin5 and really metered temperatures, functions f1-f5 expressing the relationships between the estimated temperatures and the really metered temperatures are given for the respective zones. The functions f1-f5 are substituted by the estimated wafer temperatures to correct the estimated wafer temperatures. Electric powers to be fed to the respective heaters 31-35 are respectively controlled so that the corrected wafer temperatures are converged to target temperature trajectories.