| 摘要 |
Accurate alignment can be attained irrespective of strains of the main body structure. An exposure apparatus, which has a substrate stage (13, 15) which holds and moves a substrate (18), a position measurement unit (14) for measuring the position of the substrate stage, and a control unit (16) for performing drive control of the substrate stage to align the substrate on the basis of the measured position, and which aligns the substrate and a master plate (2), and forms a pattern on the master plate on the substrate by exposure, has a strain measurement unit (9) for measuring strain of a structure (8) to which the position measurement unit is fixed, and the control unit aligns the substrate by the drive control of the stage in consideration of the measured strain.
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