Pattern forming apparatus and pattern forming method

摘要

A pattern forming apparatus for forming a pattern on a substrate comprising a first exposure section capable of pattern exposure for a predetermined line width, a second exposure section for conducting pattern exposure for a line width greater than the predetermined line width of the first exposure section, and a means for detecting the relative positional relationship between the first exposure section and the second exposure section, wherein pattern exposure is conducted by using the first exposure section and the second exposure section on the basis of the detected positional relationship.