发明名称 DEVICE FOR TREATING WAFER-SHAPED OBJECTS, ESPECIALLY SILICON WAFERS
摘要 <p>PCT No. PCT/AT96/00034 Sec. 371 Date Dec. 11, 1996 Sec. 102(e) Date Dec. 11, 1996 PCT Filed Feb. 28, 1996 PCT Pub. No. WO96/35227 PCT Pub. Date Nov. 7, 1996In chamber (1) a basket which is formed by ring (3) and retaining fingers (4) is pivotally mounted. By turning the basket, wafer-shaped article (7) which is held by retaining fingers (4) at an axial distance from ring (3) is caused to rotate. Nozzle (10 and 11) from which a treatment fluid can be applied to article (7) is assigned both to upper and lower large surface (9) of article (7).</p>
申请公布号 EP0769205(B1) 申请公布日期 2002.04.17
申请号 EP19960902801 申请日期 1996.02.28
申请人 SEZ SEMICONDUCTOR-EQUIPMENT ZUBEHOER FUER DIE HALBLEITERFERTIGUNG AG 发明人 SUMNITSCH, FRANZ
分类号 H01L21/683;H01L21/00;H01L21/304;H01L21/306;H01L21/687;(IPC1-7):H01L21/00 主分类号 H01L21/683
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