发明名称 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE
摘要 A method of manufacturing a semiconductor device comprising a step of forming a plurality of resin layers, an interconnect connected electrically to an electrode of each of a plurality of semiconductor elements, and an external terminal connected electrically to the interconnect, on an aggregate of semiconductor elements having an electrode, and a step of cutting the aggregate, wherein at least one resin layer among the plurality of resin layers is formed avoiding a cutting region of the aggregate.
申请公布号 EP1198003(A1) 申请公布日期 2002.04.17
申请号 EP20010915722 申请日期 2001.03.23
申请人 SEIKO EPSON CORPORATION 发明人 KUWABARA, KEIJI;HANAOKA, TERUNAO;ITO, HARUKI
分类号 H01L21/56;H01L21/78;H01L23/00;H01L23/31;H01L23/485 主分类号 H01L21/56
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