发明名称 |
Verfahren zur Herstellung einer monolithischen Struktur mit einem Perovskit-Kondensator |
摘要 |
<p>A method for the fabrication of a high capacity capacitor consists of: (a) coating a silicon substrate with a first insulating layer (6); (b) forming and engraving successively onto the substrate a first electrode (10), a dielectric in a ferro-electric material with a high constant dielectric (11) and a second electrode (12); (c) coating the structure with a second insulating layer (14) to encapsulate the structure of the capacitor; (d) producing some contact openings towards the semiconducting zones and towards the first electrode; (e) depositing and engraving a first conducting layer (21-25); (f) depositing a third protective insulating layer (30); (g) depositing a second conducting layer (31); (h) establishing in particular a contact with the upper electrode of the component; (i) depositing a final passivation layer (33). The ferro-electric dielectric is a perovskite.</p> |
申请公布号 |
EP1197991(A1) |
申请公布日期 |
2002.04.17 |
申请号 |
EP20010410128 |
申请日期 |
2001.10.11 |
申请人 |
STMICROELECTRONICS S.A. |
发明人 |
CHARPENTIER, PASCALE;ANCEAU, CHRISTINE |
分类号 |
H01L21/02;H01L21/768;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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