发明名称 Verfahren zur Herstellung einer monolithischen Struktur mit einem Perovskit-Kondensator
摘要 <p>A method for the fabrication of a high capacity capacitor consists of: (a) coating a silicon substrate with a first insulating layer (6); (b) forming and engraving successively onto the substrate a first electrode (10), a dielectric in a ferro-electric material with a high constant dielectric (11) and a second electrode (12); (c) coating the structure with a second insulating layer (14) to encapsulate the structure of the capacitor; (d) producing some contact openings towards the semiconducting zones and towards the first electrode; (e) depositing and engraving a first conducting layer (21-25); (f) depositing a third protective insulating layer (30); (g) depositing a second conducting layer (31); (h) establishing in particular a contact with the upper electrode of the component; (i) depositing a final passivation layer (33). The ferro-electric dielectric is a perovskite.</p>
申请公布号 EP1197991(A1) 申请公布日期 2002.04.17
申请号 EP20010410128 申请日期 2001.10.11
申请人 STMICROELECTRONICS S.A. 发明人 CHARPENTIER, PASCALE;ANCEAU, CHRISTINE
分类号 H01L21/02;H01L21/768;(IPC1-7):H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项
地址