APPARATUS FOR CLEANING SEMICONDUCTOR DEVICE AND METHOD FOR CONTROLLING DENSITY OF CLEANING SOLUTION IN CLEANING BATH OF SUCH CLEANING APPARATUS

摘要

PURPOSE: An apparatus for cleaning a semiconductor device is provided to improve productivity and yield of the semiconductor device, by uniformly maintaining the density of cleaning solution in a cleaning bath at all times. CONSTITUTION: The semiconductor device to clean and the cleaning solution are contained in the cleaning bath(10). A compound supply source supplies a compound to the cleaning bath. An electrical conductivity measuring unit(60) measures the electrical conductivity of the cleaning solution in the cleaning bath, and supplies an electrical conductivity data signal corresponding to the measured electrical conductivity. A controller(70) controls the quantity of the compound supplied from the compound supply source to the cleaning bath in response to the electrical conductivity data signal.