发明名称 |
Lithographic apparatus |
摘要 |
<p>In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation. <IMAGE></p> |
申请公布号 |
EP1197803(A2) |
申请公布日期 |
2002.04.17 |
申请号 |
EP20010308572 |
申请日期 |
2001.10.08 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN ELP, JAN;LEENDERS, MARTINUS HENDRIKUS ANTONIUS;BANINE, VADIM YEVGENYEVICH;VISSER, HUGO MATTHIEU;BAKKER, LEVINUS PIETER |
分类号 |
G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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