发明名称 Lithographic apparatus
摘要 <p>In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation. &lt;IMAGE&gt;</p>
申请公布号 EP1197803(A2) 申请公布日期 2002.04.17
申请号 EP20010308572 申请日期 2001.10.08
申请人 ASML NETHERLANDS B.V. 发明人 VAN ELP, JAN;LEENDERS, MARTINUS HENDRIKUS ANTONIUS;BANINE, VADIM YEVGENYEVICH;VISSER, HUGO MATTHIEU;BAKKER, LEVINUS PIETER
分类号 G03F7/20;(IPC1-7):G03F7/20 主分类号 G03F7/20
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