| 摘要 |
A high intensity, high temperature UV Lamp reactor system for treating aqueous media on a continuous flow basis is provided. The reac- tor system comprises a cylindrical reactor vessel, having inlets and outlets which permit the aqueous media to flow on a continuous basis through the reactor, a cylindrical UV lamp provided in the vessel and concentric there- with, a cylindrical UV transparent sheath for isolating the UV lamp from the interior space of the reactor vessel, the sheath and lamp being concen- tric with the cylindrical vessel, the sheath being sealed to the ends of the vessel to isolate the UV lamp from the aqueous media flowing through the annular reactor chamber, a brush device is provided for brushing the exte- rior surface of the sheath to remove therefrom materials deposited from the aqueous media, the brush having at least two brushes with bristles ex- tending radially inwardly towards the sheath as the brushes encompass the sheath, the brushes are coupled together in spaced apart manner on the sheath with a device for reciprocating the brushes along the sheath ex- terior, preferably on a periodic basis to remove any deposited material from the sheath and thereby maintain an acceptable level of UV radiation transmitted into the annular chamber of the reactor.
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