SAMPLE AND VAPOR SOURCE FOR MOLECULAR BEAM EPITAXY

摘要

PROBLEM TO BE SOLVED: To provide a sample and a vapor source for molecular beam epitaxy which can vaporize a high melting material at a higher vaporization rate without varying the vaporization amount during the period when the sample is used, and further, to provide a sample and a vapor source for molecular epitaxy which generates a uniform vaporization rate in the sample face. SOLUTION: The vapor source is composed of a crucible filled with a plate type solid sample and a planar heat generator to heat the crucible. The planar heat generator consists of a resistor formed on the bottom face of the crucible. Recesses and projections are formed on the surface in the substrate side of the plate type solid sample.