APPLICATION OF VAPOR PHASE HFACAC-BASED COMPOUND FOR USE IN COPPER DECONTAMINATION AND CLEANING PROCESSES,申请号SG20010004357-传众专利搜索

发明名称	APPLICATION OF VAPOR PHASE HFACAC-BASED COMPOUND FOR USE IN COPPER DECONTAMINATION AND CLEANING PROCESSES
摘要
申请公布号	SG87939(A1)	申请公布日期	2002.04.16
申请号	SG20010004357	申请日期	2001.07.17
申请人	CHARTERED SEMICONDUCTOR MANUFACTURING, LTD	发明人	YAKUB ALIYU;SIMON CHOOI;MEI SHENG ZHOU;JOHN LEONARD SUDIJONO;SUBHASH GUPTA;SUDIPTO RANENDRA ROY;PAUL HO KWOK KEUNG;YI XU
分类号	C23F1/12;H01L21/306;(IPC1-7):H01L21/44	主分类号	C23F1/12
代理机构		代理人
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